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• NodeGraph / Right Mouse Click / Add Nodes / Procedurals / Extension Pack / Generators

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• Video
• Pattern Engine

• Node Overview
• Node Outputs
• Node Ports
• Node Properties
• Main Tab

• Seed
• Amount
• Pattern
• Pattern Crop
• Input Image
• Size
• Position
• Rotation
• Symmetry
• Masking
• Layering
• Color
• Output Alphas
• Tips
• Seam Removal

Modifications of the Pattern Generator Nodes, Symmetry Pattern Nodes are specifically optimized for

symmetrical patterns

This Node shares Attributes with the Main Pattern Generator Nodes.

An in-depth tutorial on every feature of the Pattern Generator Nodes can be found below:

Pattern Engine Overview

This Node is part of a collection of Nodes making up the Pattern Engine:

• Pattern Generator X1 2D
• Pattern Generator X1 Triplanar
• Pattern Generator X4 2D
• Pattern Generator X4 Triplanar
• Symmetry Pattern X1 Triplanar
• Splatter X1 2D
• Splatter X1 Triplanar
• Splatter X4 2D
• Splatter X4 Triplanar
• Shape Splatter 2D
• Shape Splatter Triplanar

• Output

The Default Output

• Pattern UVs

Outputs the UV coordinates of the cells

• Pattern Center

Outputs the center UV coordinate for each cell as a uniform value across the entire cell

• Pattern Manifold

Outputs Manifold Data from the node that can be used to drive other nodes.

A simple example of a Pattern Generator Node driving another node via the Manifold Output

• Pattern Index

Outputs a R,G,B packed Index

• R - Row Index

Multiplies the normalized Row Number (0.0 - 1.0) against the result.

Each row will have a different value this way

       

• G - Column Index

Multiplies the normalized Column Number (0.0 - 1.0) against the result

Each column will have a different value this way

• B - Pattern Index

Multiplies the normalized Cell Number (0.0 - 1.0) against the result

Each cell will have a different value this way

• Pattern Scale

Change the Value of each Cell based on the Cell scale.

Evaluated are Random Size X/Y, Random Scale,Random Scale Map, Normal Map

Example of Scale Output

• Pattern Mask

Outputs the pure pattern result as a mask without the Background Color applied

• Pattern Random

Outputs the random signal used inside the node to randomize elements

• Manifold UV

Allows you to overwrite the UV Settings of the Node with a manifold node

• Pattern Specific 1

An option to change the look of the generated Pattern. Varies based on Patttern. Overwrites Pattern Specific 1 Slider if mapped,.

• Pattern Specific 2

An option to change the look of the generated Pattern. Varies based on Patttern. Overwrites Pattern Specific 2 Slider if mapped,.

• Edge Falloff

An option to change the look of the generated Pattern. Varies based on Patttern. Overwrites Pattern Specific 2 Slider if mapped,.

• Edge Falloff

Allows you to overwrite the Edge Falloff Attribute in the Pattern Group

• Edge Softness

Allows you to overwrite the  Edge Softness Attribute with a Node Connection

• Edge Roundness

Allows you to overwrite the  Edge Roundness Attribute with a Node Connection

• Amount

Allows setting the Amount of Cells via a Nodegraph Input.

Will overwrite the Amount X and Amount Y Sliders.

Separate values can be fed to X and Y by specifying different values for Red and Green channel of the attached node stream

• Scale Map

Allows for scale changes to Cell contents. Gets multiplied against the Scale & Size Settings found in the Size Group

Example of a cloud node                         

attached to the scale map port                        

                       

• Background

Allows for setting a Pattern Background. Fill Background needs to be turned on

• Bake Point Image

The Bake Point Image Port allows you to feed data into the Node from upstream nodes that have been baked via a bake point into the Node.

When the node is evaluated, the Bake Point attached to the Port will be sampled and the UDIM 1001 Image will be transferred into

the Image Attribute of the Node.

This allows you to create patterns and textures via a nodegraph and use them directly inside this node with an element of non-destructivness

Example of using a Nodegraph and a Bake Point to dynamically feed a Pattern Generator Node with Node Inputs

MAIN TAB

• Random Seed

By modifying the Random Seed, different looks can be achieved with the otherwise same settings. 

• Amount Multiplier

A multiplier on the amount of Cells generated. Each cell is processed independently with the given settings (Position, Rotation etc. etc.)

• Amount X

Amount of cells generated horizontally. Each cell is processed independently with the given settings (Position, Rotation etc. etc.)

• Amount Y

Amount of cells generated vertically. Each cell is processed independently with the given settings (Position, Rotation etc. etc.)

• Pattern

Determines what pattern is used to fill each cell.

Options are

• A File Texture (Input Image)

Supply a Texture in the Input Image Section

• One of 23 procedurally generated Patterns

For a complete overview of all procedural patterns visit the Shape Node Help 

• Pattern Specific 1

An Option to change the look of procedurally generated Patterns. Varies based on Patttern

• Pattern Specific 2

An Option to change the look of procedurally generated Patterns. Varies based on Patttern

• Pattern Size

Determines the size of the procedurally generated Pattern within a cell.

Please note this works together with any size/scale specified in the Size Group.

• Pattern Rotate

Determines the rotation of the procedurally generated Pattern within a cell

• Pattern Alpha Intensity

Determines the processing of the Alpha Channel of a procedurally generated pattern.

Example of reducing the Alpha Intensity from 1 to 0 on a large Hemisphere pattern

• Pattern Repeat U

Repeats the pattern or input image x-amount of times horizontally in each cell.

Example of increasing Pattern Repeat U

 on a 'Gaussian' Pattern

• Pattern Repeat V

Repeats the pattern or input image x-amount of times vertically in each cell.

• Invert Pattern

Invert pattern or Input Image

• Blend Mode

The Blend Mode used to overlay a cell over other cells

Example of different effects achieved by changing the blend mode

• Edge Controls

The Edge Controls give you control over the edge transparency of the generated pattern, allowing you to create 'Brush Effects'

• Edge Falloff

Will contract the edges of your loaded textures. This parameter can also be mapped via the Nodegraph

• Edge Softness

Will feather the edges of your loaded textures from the start of the Edge Falloff to the centre of your texture.

This parameter can also be mapped via the Nodegraph

• Edge Roundness

Switches the Falloff from Square (0.0) to Radial (1.0).

This parameter can also be mapped via the Nodegraph

• Edge Distortion

The Edge Distortion is distorting the alpha in the softened areas based on the luminance of the pattern.

If Edge Distortion is 1.0 black parts of the pattern inside the cell will be hidden in the area of Edge Softness.

If Edge Distortion is -1.0 white parts of the pattern inside the cell will be hidden in the area of Edge Softness.

Example of raising Edge Distortion from 0 to 1

The Pattern Crop options allow to 'cut' the edges of a patterns or input images, allowing even more variation

Example of using the Pattern Crop to generate a triangle from a square

• Top

Control the Crop from Top to Bottom per Shape

• Bottom

Control the Crop from Bottom to Top per Shape

• Left

Control the Crop from Left to Right per Shape

• Right

Control the Crop from Right to Left per Shape

• Rotate

Rotate the Crop 'Frame' around its center

• Map

Supply a texture map to use in the processing.

• Mipmap Blur

Allows you to blur the input image. This feature requires Mari 4.6v2.

• Image Type

If an image is specified as a Normal Map, rotating images recalculates normal vectors for correct lighting results.

Below you can see an example of this. The Material and its normal map was rotated 90 degrees from its original output.

• With the Normal Map specified in the Image Type, Mari correctly recalculate the normal map vectors for rotation changes resulting in consistent lighting in viewport & render.
• If the Normal Map is treated as a 'Standard Texture', no normal orientation is recalcuated, resulting in incorrect lighting in viewport & render

• Alpha

Configure the Alpha Handling of the supplied image.

• From Map

The Transparency in your loaded texture map is used

• Alpha is Luminance

The Luminance of your loaded texture map is used as Alpha.

Black is transparent.

• Alpha is Inverted Luminance

The inverted Luminance of your loaded texture map is used as Alpha.

White is transparent.

• White

The Alpha of the loaded map is set to white resulting in the image being 100% opaque.

• Size X

The horizontal size of each cell

• Size Y

The vertical size of each cell

• Scale

A uniform scale factor.

• Random Scale

Mix Factor for uniform scale randomization.

Positive Values (0 - 1) will reduce the size of the cells randomly.

Positive Values (0 - 1) will increase the size of the cells randomly.

• Offset

Sets an offset for cells. The type of offset is determined by the Offset Type (see below)

• Offset Type

• Horizontal quuincux

Controlled by the Offset Slider this will offset every second row of cells

• Vertical quuincux

Controlled by the Offset Slider this will offset every second column of cells

• Horizontal Global Normalized

This will add the value specified in Offset to each row successively then normalize the Offset to prevent it from going over 1.0.

e.g. 

Offset Value = 0.2

Row 1 will receive an offset of 0.2 in X

Row 2 will receive an offset of 0.4 in X

Row 3 will receive an offset of 0.6 in X 

Row 4 will receive an offset of 0.8 in X 

.

.

• Verrtical Global Normalized

This will add the value specified in Offset to each row successively then normalize the Offset to prevent it from going over 1.0.

e.g. 

Offset Value = 0.2

Row 1 will receive an offset of 0.2 in X

Row 2 will receive an offset of 0.4 in X

Row 3 will receive an offset of 0.6 in X 

Row 4 will receive an offset of 0.8 in X 

Row 5 will receive an offset of 1.0 in X 

Row 6 will receive an offset of 0.2 in X

Row 7 will receive an offset of 0.4 in X

.

.

• Horizontal Global

This will add the value specified in Offset to each row successively.

e.g. 

Offset Value = 0.2

Row 1 will receive an offset of 0.2 in X

Row 2 will receive an offset of 0.4 in X

Row 3 will receive an offset of 0.6 in X 

Row 4 will receive an offset of 0.8 in X 

Row 5 will receive an offset of 1.0 in X 

Row 6 will receive an offset of 1.2 in X 

Row 7 will receive an offset of 1.4 in X 

.

.

• Vertical Global

This will add the value specified in Offset to each column successively.

e.g. 

Offset Value = 0.2

Column 1 will receive an offset of 0.2 in Y

Column 2 will receive an offset of 0.4 in Y

Column 3 will receive an offset of 0.6 in Y 

Column 4 will receive an offset of 0.8 in Y 

Column 5 will receive an offset of 1.0 in Y 

Column 6 will receive an offset of 1.2 in Y 

Column 7 will receive an offset of 1.4 in Y 

.

.

• Global Offset X/Y

Applies a global offset of the generated Pattern (all cells) along X or Y

• Rotation

Applies a rotation to each cell

• Global Rotation

Rotates the end result of the Pattern Generation. (globally, instead of per cell)

• Rotation Pivot Centered

Controls the Rotation Pivot for the Global Rotation Slider.

If ticked on, the Pivot sits at the center of each UDIM (0.5,0.5)

If ticked off, the Pivot sits at U/V 0.0 of UDIM 1001

• Alternate Rotation

Applies a secondary rotation to the cells specified in the Alternate Rotation Method

Example of an alternate Rotation

with the Alternate Rotation Method set

to "Every Second row"

• Alternate Rotation Method

Determines which cells are affected by the Alternate Rotation Slider.

• Every Second Row
• Every Second Column
• Every Second Row and Column

• Rotation Random

Applies a random rotation to Cells

• Alternate Symmetry

Applies a Mirroring effect to the cells specified

• None

Alternate Symmetry is disabled (default)

• Every Second Row

Every second row is mirrored in X, Y or X and Y (depending on the setting chosen in Alternate Symmetry affects)

• Every Second Column

Every second column is mirrored in X, Y or X and Y (depending on the setting chosen in Alternate Symmetry affects)

• Every Second Row and Column

Every second Row and column is mirrored in X, Y or X and Y (depending on the setting chosen in Alternate Symmetry affects)

• Mirrored

Similar to Every Second Column tries to create mirrored pairs in X. 

Ignores Alternate Symmetry affects.

• Alternate Symmetry affects

Determines the mirroring axis for the Alternate Symmetry.

• Random Symmetry

Applies a Mirroring effect to random selection of cells

Example of Random Symmetry in X

• Random Symmetry affects

Determines the Mirror Axis to use for Random Symmetry

• Flip X / Y 

Flips the cells in X or Y

• Alternate Masking

Applies a alternate Masking to the cells specified

• Ignore

Alternate Masking is disabled (default)

• Every Second Row

Every second row is hidden

• Every Second Column

Every second column is hidden

• Every Second Row and Column

Every second Row and column is hidden

• Layer Cutoff

The Layer Cutoff determines the number of iterations and radius around each cell the node runs through before it stops calculating.

If you are experiencing Seams this might be the reason

To better understand this behavior and to anticipate consider this:

• By default each cell is generated in a grid pattern at a scale of 1.
• Each cell has an internal position of 0.0 for its own coordinate system

If you change the position of a cell from its original position of 0.0/0.0 the Layer Cutoff needs to be increased

for a wider sample radius. So for example 

• adding a Random Position Value of 1.0/1.0 means we need to sample up to 1 additional cell around the original cell.
• We need to increase the Layer Cutoff to at least 2

• adding a Random Position Value of 2.0/2.0 means we need to sample up to 2 additional cell around the original cell.
• We need to increase the Layer Cutoff to at least 3

If you change the scale of a cell from its original scale of 1.0  the Layer Cutoff needs to be increased

for a wider sample radius. So for example 

• Changing the Scale to 2 means we need to sample 1 additional cell around the original cell.
• We need to increase the Layer Cutoff to at least 2

• Changing the Scale to 4 means we need to sample 3 additional cell around the original cell.
• We need to increase the Layer Cutoff to at least 4

• Fill Background

If ticked on, the Pattern will be generated over the Background defined in the Background Color or the background attached to the Background Node port

• Background Color

The Background Color for the Pattern if Fill Background is ticked on. The Background Color is ignores if something is attached to the Background Node port

• Scale Normal Map Intensity

If a Normal Map is used in the Input Image, this slider can be used to modulate the normal strength based on the size of the feature

The Settings found in the Output Alphas Group determine how transparency of cell content is treated in the additional Output Ports of the Node 

(Pattern UVs, Pattern Center, Pattern Index, Pattern Manifold and Pattern Scale)

• UVs premultiply

Premultiplies the transparency of cell content returned on the Pattern UVs output Port

• Center premultiply

Premultiplies the transparency of cell content returned on the Pattern Center output Port

• Index/Manifold premultiply

Premultiplies the transparency of cell content returned on the Pattern Index and Pattern Manifold output Ports

• Scale premultiply

Premultiplies the transparency of cell content returned on the Pattern Scale output Port

• Random premultiply

Premultiplies the transparency of cell content returned on the Pattern Random output Port

If you are seeing seams in your pattern try raising the Layer Cutoff